KR-2271
Development of system and technology for interference lithography with direct laser recording on amorphous silicon film and its applications
Current status of research. Computer-generated holograms (CGH) are usually made using the electron-beam or laser recorders. Such devices are very complex and expensive, and time of manufacture of the CGH is very long. Also known methods of manufacturing hologram interference method by recording the interference pattern in a layer of photoresist. In recent years a proliferation of scanning systems interference lithography (SIL), which form the diffractive structure by a consistent record of small fragments or cells. In SIL microstructurization of surface is realizing by consistent record of microgratings formed by interference of two coherent focused laser beams in a photosensitive recording material. Known devices and methods of interference lithography are based on the exposure of thin films of organic photoresists deposited on the optical substrate. However, these methods do not allow to produce diffractive structures on large size thick substrates because it’s not possible to cover photoresist on such substrate . There are a number of objectives when diffractive structure should be applied to three-dimensional objects, such as convex or concave mirrors. This task can not be solved by known methods of interference lithography.
Development of methods for direct laser writing on inorganic evaporated film will allow to record diffraction structures on large size and different shape substrate and objects .
Effect of the proposed project on the progress in this area. In proposed project an experimental setup and technology for direct laser recording of submicron and nanostructures on amorphous silicon layers will be developed. It will allow in the future to design and create a compact laser recording devices to record the original CGH with bar codes, personification of data, cards of payment instruments, etc. One of the ideas that will be implemented, is to develop a method for recording information in the CGH, which practically couldn’t be counterfeited. This feature is based on the properties of amorphous silicon film. It could solve the problem of protection from counterfeiting for embossing holograms. The social significance of this work for the CIS countries is protection of small businesses from counterfeiting and copyrights. In particular, it is relevant for small countries with open economies as Kyrgyz Republic. Use of special labels and marks for protection of goods produced by honest manufacturers is one of the ways to prevent unfair competition.
The competence of project participants in this field. The participants of this project have many years experience in development of technology and systems for direct laser writing, as evidenced by existing publications and presentations at international conferences, that can be found on the website of the Institute http://www.iae.nsk.su/index.php/ ru / publications. The authors of this project jointly patented a device for laser writing, which can be used as a prototype for this project. The authors of this project, have successful experience in implementation of international projects and contracts, for example: a project on the NATO Science for Peace ", project number 973702 (2001-2005.) and some others. Also, there are necessary equipment and technology base in laboratories participating in project.
Expected results and their application. Under completion of project the following results are expected:
2. Method for thin amorphous silicon layers deposition on different surfaces will be developed.
3. Recording regimes and physical processes occurring in thin amorphous silicon films under the interaction of a focused pulsed ultraviolet (UV) laser radiation will be investigated.
4. Applications of the recorded diffractive structures on a-Si films for anti-reflective coatings, bar codes, attenuators and computer-generated holograms will be researched