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Thin Film Structure


Development of a Comprehensive Approach to Study a Structure of Thin-Film Systems

Tech Area / Field

  • PHY-SSP/Solid State Physics/Physics
  • MAN-MAT/Engineering Materials/Manufacturing Technology
  • MAN-MPS/Manufacturing, Planning, Processing and Control/Manufacturing Technology
  • MAT-COM/Composites/Materials

8 Project completed

Registration date

Completion date

Senior Project Manager
Visser H

Leading Institute
St Petersburg State University, Russia, St Petersburg

Supporting institutes

  • VNIIEF, Russia, N. Novgorod reg., Sarov


  • Fraunhofer Institute Angewandte Optik und Feinmechanik, Germany, Jena\nCNRS / Universite Pierre & Marie Curie / Laboratoire de Chimie Physique - Matiere et Rayonnement, France, Paris\nInstitute of Electronic Structure & Laser, Greece, Heraklione

Project summary

Today the thin-film and multi-layered coatings are widely used in microelectronics, materials science, optics, and X-ray optics. The quality of film coatings is often a governing factor determining the marginal parameters of microelectronic and optical devices. Any arising deviations of physical and geometrical parameters of coatings from desirable ones cause fluctuations of their electronic properties and, in some cases, complete vanishing of quantum-dimensional effects in nanoelectronic devices or catastrophic incidence of reflection from short-period multilayered X-ray mirrors. This, in turn, stipulates higher requirements to thin film generation technologies and quality control means. Note that thickness of coatings can be as small as units of magnitude and even fractions of a nanometer, i.e. the root-mean-square roughness should not exceed 0.1-0.2nm and, hence, the role of inter-layers (extensions and structures) which are generated on the interface between two different substances due to inter-diffusion, chemical reactions and implantation during synthesis of films increases. Preference is given to non-destructive methods adapted to a specific technology of multilayered structures, including search and development of complementary methods allowing to establish interrelation between electrophysical properties and a microstructure of grown or synthesized coatings. In this connection, the goal of the project, i.e. adaptation of existing approaches and development of new ones in the x-ray methods providing the complex analysis of structures, is of interest for basic research and industry.

The project goals are:

  1. to develop a comprehensive approach to study a structure of thin-film systems (including surface morphology and film-substrate interface), which combines the complementary methods of substance analysis based on different physical principles.
  2. to make an X-ray reflection camera enabling investigation within the range of soft X-rays.
  3. to carry out quantitative (including in-situ) investigations of a thin film structure, basing on the developed approach, as well as investigations in the developed reflection camera, which are having prospects for application in micro- and nano-electronics and X-ray optics.

The project will accomplish the following tasks:
  1. Research of the general mechanisms of generation (evolution of roughness and crystal structure) of thin films in the course of their growth and erosion to determine the patterns of relationship aimed at further development of a scaling model.
  2. Development of approaches to determine the profile of elements concentration in depth of a sample.
  3. Development, manufacturing, assembling and approbation of a reflection camera for the laboratory monochromator spectrometer RSM-500.
  4. Synthesis and investigation of electronic, optical and electro-physical properties of multilayered structures based on the films of А2В6 and А4 compounds and liquid crystals.

The project participants are experts in the X-ray methods of materials study and have published more than 200 papers on the subject.

The project participants from VNIIEF were formerly involved in development and tests of the nuclear weapons.