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X-ray and Extreme UV Technologies

#1422


Advanced XUV Technology: Methods, Sources, Instruments

Tech Area / Field

  • PHY-OPL/Optics and Lasers/Physics
  • PHY-PLS/Plasma Physics/Physics

Status
3 Approved without Funding

Registration date
15.12.1998

Leading Institute
FIAN Lebedev, Russia, Moscow

Supporting institutes

  • VNIIEF, Russia, N. Novgorod reg., Sarov

Collaborators

  • Brigham Young University, USA, UT, Provo\nUniversity of Illinois / Department of Physics, USA, IL, Chicago

Project summary

The goal of the Project is to develop a new innovative soft X-ray and extreme UV (XUV) technology including the development of advanced XUV sources, advanced XUV normal incidence optical elements, advanced spectroscopic instruments and advanced spectroscopic methods. The XUV technology developed under Project activity will be used in modern electronics, biology and medicine, in solid state physics and in the diagnostics of laboratory and astrophysical plasmas.

The new proposed Project is based on the results of the ISTC Project #021-95 "Civil Applications of Ultrabright Laser-Produced Plasma Source of X-Ray Radiation" completed on the October 31, 1998.

Two types of XUV sources will be used in the Project - laser produced plasmas (LPP) and plasmas of capillary discharge. Due to agreement with foreign collaborators their facilities will be available for Russian scientists. To create the LPP we will use different type of laser facilities -high intensity subpicosecond ultraviolet laser in USA, high intensity picosecond laser and nanosecond laser in Russia. For investigation of capillary discharge two facilities will be used - the existing experimental setup at the BYU and device which will be made in the name of this Project at the VNIIEF.

The investigation of interaction of multiply charged ions, created in LPP, with a solid surface (wall) using XUV spectroscopy methods will be performed. The main attention will be paid to experimental study of ablation of the wall material, recombination processes of multiply charged ions in the boundary layer (three-body recombination, charge exchange) under different experimental conditions. These investigations could result in significant increase of the output of XUV radiation, and at the same time substantially reduce the cost of a XUV capillary discharge sources.

To develop the XUV optical components, normal incidence multilayer mirrors (MLM) a magnetron sputtering in rf- and de-modes as well as a pulsed laser deposition will be used. The detailed parameters of the MLM will be characterized by small-angle x-ray diffraction method and by investigation of reflection near normal incidence.

The theoretical groups at the LPI and VNIIEF will be responsible for investigations of fundamental processes in plasmas. This research will include calculations of elementary processes, cross sections, spectra analysis and plasma dynamics in capillary discharge plasma and nanosecond and subpicosecond laser-produced plasmas.

Particular results foreseen are the following:


- A fundamental advance in the understanding of the physics of capillary discharge and laser-produced plasmas, including the excitation of ions and the plasma-wall interaction, emission of the XUV radiation from these plasmas.
- Development of a new type of a capillary discharge source, optimization of parameters of a capillary discharge and laser-produced plasma XUV source. It will be an enabling technology for biology, x-ray lithography and microscopy applications.
- Development and fabrication of high reflectivity normal incidence multilayer mirrors for EUV lithography and for "water window" spectral region. These optical elements could be used also as a basis for XUV space research as it was demonstrated in SOHO, YOHO, FOBOS, CORONAS Projects.
- Development and fabrication of advanced XUV spectral instruments - a von Hamos crystal focusing spectrometer and a grazing incidence spectrometer. Due to compact size, high efficiency, high spectral resolution, wide spectral range these instruments could find a broad scientific and commercial applications.

Prof. C.K.Rhodes (University of Illinois at Chicago, USA) and Prof. L.V.Knight (Brigham Young University, Utah, USA) agree to be the foreign collaborators of the Project. Joint research is foreseen together with their own program in the nearby fields. The foreign collaborators will provide an inpidual expert examination of the Project and promote the cooperation and information interchange between Russian and foreign scientists.


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